Utilizing Secondary Ion Mass Spectrometry (SIMS) for in-line metrology is a newly emerging method of process control that requires contamination-free measurements, enabling SIMS on product wafers.

Quasi-real-time range monitoring by in-beam PET: a case for 15 O In order to perform proper treatment planning with positron-emitting radioactive beams, and to understand how their use will impact ...

Both backscattered electrons (BSE) and second electrons (SE) are generated when a primary beam interacts with a sample. Images of samples that are acquired and detected by these emitted signals can ...